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One of the main problems in nanotechnology is the lack of methods for mass production. This is especially true for Small and medium-sized enterprises (SMEs), which do not have the ability to invest in expensive equipment for large-scale production of nanostructures. Nanoimprint lithography (NIL) is a tool that is comparably cheap and suited for mass production. The project 3DNANOPRINT aimed at the development of a complete process technology with the necessary tools to produce three-dimensional (3D) nanostructures with ultra high precision. In comparison to deep or extreme ultra violet lithography (abbreviated as DUV and EUV lithography, respectively) this research paved the way for the widespread use of a nanoscale production technology also by smaller companies, since the investment costs of nanoimprint production lines are significantly less than the ones for DUV or EUV lithography.
In nanoimprint lithography a micro- and / or nano-structured stamp is used to pattern a polymer. If necessary this polymer can then be used to transfer this pattern into a substrate by an etching process.
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The pattern replication is done under well controlled conditions by hardening the initially liquid polymer, while the stamp is still pressed into it, and subsequent separation of stamp and then hard polymer. The project consisted of two levels, a directly process oriented part dealing with nanoimprint lithography itself, nanoimprint resists, reactive ion etching and alignment problems and a second more application oriented part. In the second part requirements for nanoimprint lithography as production tool are defined, assuring that the final result of the project is a cost effective, high throughput, ultraprecise tool for the production of 3D nanostructures.